Incazelo
I-Sapphire Single Crystal Wafer & Ingotor I-Aluminium oxide Al2O3I-99.999% min, eyaziwa nangokuthi amatshe amhlophe, isakhiwo se-anisotropic hexagonal, iyinto enhle kakhulu enezinjongo eziningi enezindawo ezibonakalayo ezihlukile, izakhiwo zomzimba kanye nezakhiwo zamakhemikhali, ezinobunzima obuphezulu obuphezulu, ukushisa okuphezulu kwe-thermal, ukungaguquki okuphezulu kwe-dielectric, ukukhanya okuhle kakhulu nokuhle. ukuzinza kwamakhemikhali nokumelana nama-acid amakhemikhali avamile nama-alkali.Isafire I-Crystal eyodwa noma i-Aluminium Oxide icrystal eyodwa Al2O3Ukuhlanzeka okungu-99.999% e-Western Minmetals (SC) Corporation kungalethwa ngosayizi wobubanzi obungu-2″, 4″ no-6″ (50mm, 100mm, 150mm) i-wafer ne-ingot, enomkhawulo ongaphezulu ekuqedweni kwenqubo eqoshiwe, epholishiwe noma elungele i-epi.Noma yikuphi ukucaciswa okwenziwe ngezifiso kanye nosayizi kuyisixazululo esihle kakhulu kumakhasimende ethu emhlabeni jikelele.
Izinhlelo zokusebenza
Ngenxa yamandla ayo esakhiwo sekristalu yesibili eqinile eduze kwedayimane, ikristalu yeSapphire isetshenziswa kabanzi ekwenzeni i-single crystal substrate, i-superconducting film substrate material, ama-LED akhipha ukukhanya okuluhlaza okwesibhakabhaka, okunsomi nokumhlophe, ama-LED, iwindi le-infrared elinezinga lokushisa eliphezulu, i-laser eluhlaza okwesibhakabhaka i-LD Industrial substrate ekhethwayo.I-Single Crystal Sapphire noma i-crystal aluminium oxide eyodwa i-Al2O3 iwusizo ebangeni lokudlulisela elisuka ku-0.2-5.5 μm kanye nakwezinye izimboni ezithuthukisiwe zokukhiqiza ama-semiconductors amandla.
Ukucaciswa Kwezobuchwepheshe
I-Sapphire Crystal, enamandla esakhiwo sekristalu yesibili eqinile eduze kwedayimane, isetshenziswa kabanzi ekwenzeni i-crystal substrate eyodwa, i-superconducting film substrate material, ama-LED akhipha ukukhanya okuluhlaza okwesibhakabhaka, okunsomi nokumhlophe, iwindi le-infrared elinokushisa okuphezulu, ne-laser eluhlaza okwesibhakabhaka. I-LD Industrial substrate ekhethwayo.I-Single Crystal Sapphire noma i-crystal aluminium oxide eyodwa i-Al2O3 iwusizo ebangeni lokudlulisela elisuka ku-0.2-5.5 μm kanye nakwezinye izimboni ezithuthukisiwe zokukhiqiza ama-semiconductors amandla.
Cha. | Izinto | Ukucaciswa Okujwayelekile | ||
1 | Ububanzi mm | 50.8±0.05 | 100±0.1 | 150±0.2 |
2 | Indlela Yokukhula | I-HEM | I-HEM | I-HEM |
3 | Ukuqondisa | (CA) noma (CM) | (CA) noma (CM) | (CA) noma (CM) |
4 | Indawo Eyisisekelo Yefulethi | I-A-eksisi ±0.2° | I-A-eksisi ±0.2° | I-A-eksisi ±0.2° |
5 | Ubude Befulethi obuyinhloko mm | 16±0.5 | 30±0.5 | 47.5±0.5 |
6 | Ubukhulu μm | 430±10 | 650±20 | 1300±20 |
7 | I-TTV μm max | 5 | 10 | 15 |
8 | Khothama μm max | 5 | 10 | 15 |
9 | I-Warp μm max | 8 | 15 | 30 |
10 | I-Surface Qeda | P/E | P/E | P/E |
11 | Ukuqina Kobuso nm | <0.2 (i-epi-ready, indawo epholishiwe) | ||
12 | Ukupakisha | Esikhwameni sevacuum esigcwele umoya we-nitrogen | ||
13 | Ukuphawula | Ingot nenqwaba kufika ku-8" iyatholakala uma icelwa. |
Ifomula yomugqa | Al2O3 |
Isisindo samangqamuzana | 101.96 |
Isakhiwo sekristalu | I-Hexagonal |
Ukubukeka | Okuqinile okukhanyayo |
I-Melting Point | 2050 °C, 3720 °F |
Iphuzu elibilayo | 2977 °C, 5391 °F |
Ukuminyana ku-300K | 4.0 g/cm3 |
Igebe Lamandla | N/A |
Ukumelana kwangaphakathi | 1E16 Ω-cm |
Inombolo ye-CAS | 1344-28-1 |
Inombolo ye-EC | N/A |
I-Sapphire Single CrystalnomaI-aluminium oxideikristalu eyodwa Al2O3Ukuhlanzeka okungu-99.999% e-Western Minmetals (SC) Corporation kungalethwa ngosayizi wobubanzi obungu-2″, 4″ no-6″ (50mm, 100mm, 150mm) i-wafer ne-ingot, enomkhawulo ongaphezulu ekuqedweni kwenqubo eqoshiwe, epholishiwe noma elungele i-epi.Noma yikuphi ukucaciswa okwenziwe ngezifiso kanye nosayizi kuyisixazululo esihle kakhulu kumakhasimende ethu emhlabeni jikelele.
Amathiphu Okuthenga
I-Sapphire Crystal Aluminium Oxide Crystal