Incazelo
I-Gallium Nitride GaN, I-CAS 25617-97-4, i-molecular mass 83.73, i-wurtzite crystal structure, iyinhlanganisela kanambambili eqondile ye-band-gap semiconductor yeqembu III-V ekhule ngendlela yenqubo ye-ammonothermal ethuthuke kakhulu.Iphawuleka ngekhwalithi ephelele yekristalu, ukuqhutshwa kokushisa okuphezulu, ukuhamba kwe-electron ephezulu, insimu kagesi ebucayi kakhulu kanye ne-bandgap ebanzi, i-Gallium Nitride GaN inezici ezifiselekayo kuma-optoelectronics kanye nezicelo zokuzwa.
Izinhlelo zokusebenza
I-Gallium Nitride GaN ilungele ukukhiqizwa kwezingxenye ze-LED zama-LED, i-laser kanye nemishini ye-optoelectronics efana ne-green and blue lasers, high electron mobility transistors (HEMTs) imikhiqizo kanye namandla aphezulu. kanye nemboni yokukhiqiza amadivayisi asezingeni eliphezulu.
Ukulethwa
I-Gallium Nitride GaN e-Western Minmetals (SC) Corporation inganikezwa ngosayizi we-wafer eyindilinga eyi-intshi engu-2 ” noma 4 ” (50mm, 100mm) kanye ne-wafer yesikwele engu-10×10 noma engu-10×5 mm.Noma yimuphi usayizi owenziwe ngezifiso kanye nokucaciswa kuyisixazululo esiphelele kumakhasimende ethu emhlabeni jikelele.
Ukucaciswa Kwezobuchwepheshe
I-Gallium Nitride GaNe-Western Minmetals (SC) Corporation inganikezwa ngosayizi we-wafer eyindilinga eyi-intshi engu-2 ” noma 4 ” (50mm, 100mm) kanye ne-wafer yesikwele engu-10×10 noma engu-10×5 mm.Noma yimuphi usayizi owenziwe ngezifiso kanye nokucaciswa kuyisixazululo esiphelele kumakhasimende ethu emhlabeni jikelele.
Cha. | Izinto | Ukucaciswa Okujwayelekile | ||
1 | Isimo | Isiyingi | Isiyingi | Isikwele |
2 | Usayizi | 2" | 4" | -- |
3 | Ububanzi mm | 50.8±0.5 | 100±0.5 | -- |
4 | Ubude obuseceleni mm | -- | -- | 10x10 noma 10x5 |
5 | Indlela Yokukhula | I-HVPE | I-HVPE | I-HVPE |
6 | Ukuqondisa | I-C-plane (0001) | I-C-plane (0001) | I-C-plane (0001) |
7 | Uhlobo lwe-Conductivity | I-N-type/Si-doped, Un-doped, Semi-insulating | ||
8 | Ukungazweli Ω-cm | <0.1, <0.05, >1E6 | ||
9 | Ubukhulu μm | 350±25 | 350±25 | 350±25 |
10 | I-TTV μm max | 15 | 15 | 15 |
11 | Khothama μm max | 20 | 20 | 20 |
12 | EPD cm-2 | <5E8 | <5E8 | <5E8 |
13 | I-Surface Qeda | P/E, P/P | P/E, P/P | P/E, P/P |
14 | Ukuqina Kobuso | Ngaphambili: ≤0.2nm, Emuva: 0.5-1.5μm noma ≤0.2nm | ||
15 | Ukupakisha | Isiqukathi esilucwecwana esisodwa sivalwe esikhwameni se-Aluminium. |
Ifomula yomugqa | I-GaN |
Isisindo samangqamuzana | 83.73 |
Isakhiwo sekristalu | I-Zinc blende/Wurzite |
Ukubukeka | Okuqinile okukhanyayo |
I-Melting Point | 2500 °C |
Iphuzu elibilayo | N/A |
Ukuminyana ku-300K | 6.15 g/cm3 |
Igebe Lamandla | (3.2-3.29) eV ngo-300K |
Ukumelana kwangaphakathi | >1E8 Ω-cm |
Inombolo ye-CAS | 25617-97-4 |
Inombolo ye-EC | 247-129-0 |
I-Gallium Nitride GaNilungele ukukhiqizwa kwejubane eliphezulu elisezingeni eliphezulu kanye nomthamo ophezulu ogqamile okhipha ama-diode wezingxenye ze-LED, amadivaysi e-laser nama-optoelectronics afana namalaser aluhlaza naluhlaza, imikhiqizo yama-electron mobility transistors (HEMTs) aphezulu futhi enamandla aphezulu naphezulu- Imboni yokukhiqiza amadivayisi okushisa.
Amathiphu Okuthenga
I-Gallium Nitride GaN