Incazelo
I-Gallium ArsenideI-GaAs yin a i-direct band gap compound semiconductor yeqembu III-V ehlanganiswe okungenani yi-6N 7N high purity gallium kanye ne-arsenic element, kanye nekristalu elikhule nge-VGF noma inqubo ye-LEC kusukela ekuhlanzekeni okuphezulu kwe-polycrystalline gallium arsenide, ukubukeka kombala ompunga, amakristalu ayi-cubic anesakhiwo se-zinc-blende.Ngokusetshenziswa kwe-doping ye-carbon, i-silicon, i-tellurium noma i-zinc ukuze uthole uhlobo lwe-n noma uhlobo lwe-p kanye ne-semi-insulating conductivity ngokulandelanayo, i-cylindrical InAs crystal ingasikwa futhi yenziwe ibe yinto engenalutho kanye ne-wafer in as-cut, etched, polished noma epi. -ilungele i-MBE noma i-MOCVD ukukhula kwe-epitaxial.I-wafer ye-Gallium Arsenide isetshenziselwa ngokuyinhloko ukwenza izinto zikagesi ezifana ne-infrared light-emitting diode, ama-laser diode, amawindi okukhanya, ama-FET we-field-effect transistors, umugqa wama-ICs edijithali namaseli elanga.Izingxenye ze-GaAs ziwusizo kumaza omsakazo aphezulu kakhulu kanye nohlelo lokushintshwa kwe-elekthronikhi olusheshayo, izinhlelo zokusebenza zokukhulisa izignali ezibuthakathaka.Ngaphezu kwalokho, i-Gallium Arsenide substrate iwumsebenzi olungele ukwakhiwa kwezingxenye ze-RF, imvamisa ye-microwave nama-monolithic ICs, kanye namadivayisi we-LEDs kumasistimu okuxhumana okukhanya nokulawula ukuhamba kwawo kwehholo okugcwalayo, amandla aphezulu kanye nokuzinza kwezinga lokushisa.
Ukulethwa
I-Gallium Arsenide GaAs e-Western Minmetals (SC) Corporation ingahlinzekwa njengesigaxa se-polycrystalline noma isicwecwana esiyikristalu esisodwa kuma-wafer as-cut, aqoshiwe, aphucuziwe, noma alungele i-epi ngosayizi ongu-2” 3” 4” kanye no-6” (50mm, 75mm, 100mm, 150mm) ububanzi, nohlobo lwe-p, uhlobo lwe-n noma i-semi-insulating conductivity, kanye ne-<111> noma <100> umumo.Ukucaciswa okwenziwe ngezifiso kuyisixazululo esiphelele kumakhasimende ethu emhlabeni jikelele.
Ukucaciswa Kwezobuchwepheshe
I-Gallium Arsenide Gasama-wafer asetshenziselwa ngokuyinhloko ukwenza izinto zikagesi ezifana ne-infrared light-emitting diode, ama-laser diode, amafasitela abonakalayo, ama-FET we-field-effect transistors, umugqa wama-IC wedijithali namaseli elanga.Izingxenye ze-GaAs ziwusizo kumaza omsakazo aphezulu kakhulu kanye nohlelo lokushintshwa kwe-elekthronikhi olusheshayo, izinhlelo zokusebenza zokukhulisa izignali ezibuthakathaka.Ngaphezu kwalokho, i-Gallium Arsenide substrate iwumsebenzi olungele ukwakhiwa kwezingxenye ze-RF, imvamisa ye-microwave nama-monolithic ICs, kanye namadivayisi we-LEDs kumasistimu okuxhumana okukhanya nokulawula ukuhamba kwawo kwehholo okugcwalayo, amandla aphezulu kanye nokuzinza kwezinga lokushisa.
Cha. | Izinto | Ukucaciswa Okujwayelekile | |||
1 | Usayizi | 2" | 3" | 4" | 6" |
2 | Ububanzi mm | 50.8±0.3 | 76.2±0.3 | 100±0.5 | 150±0.5 |
3 | Indlela Yokukhula | VGF | VGF | VGF | VGF |
4 | Uhlobo lwe-Conductivity | I-N-Type/Si noma i-Te-doped, i-P-Type/Zn-doped, i-Semi-Insulating/Un-doped | |||
5 | Ukuqondisa | (100)±0.5° | (100)±0.5° | (100)±0.5° | (100)±0.5° |
6 | Ubukhulu μm | 350±25 | 625±25 | 625±25 | 650±25 |
7 | I-Orientation Flat mm | 17±1 | 22±1 | 32±1 | Inothi |
8 | I-Identification Flat mm | 7±1 | 12±1 | 18±1 | - |
9 | Ukungazweli Ω-cm | (1-9)E(-3) yohlobo lwe-p noma lwe-n, (1-10)E8 ye-semi-insulating | |||
10 | Ukuhamba cm2/vs | 50-120 yohlobo lwe-p, (1-2.5)E3 yohlobo lwe-n, ≥4000 ye-semi-insulating | |||
11 | I-Carrier Concentration cm-3 | (5-50)E18 yohlobo lwe-p, (0.8-4)E18 yohlobo luka-n | |||
12 | I-TTV μm max | 10 | 10 | 10 | 10 |
13 | Khothama μm max | 30 | 30 | 30 | 30 |
14 | I-Warp μm max | 30 | 30 | 30 | 30 |
15 | EPD cm-2 | 5000 | 5000 | 5000 | 5000 |
16 | I-Surface Qeda | P/E, P/P | P/E, P/P | P/E, P/P | P/E, P/P |
17 | Ukupakisha | Isiqukathi esilucwecwana esisodwa esivalwe esikhwameni esiyinhlanganisela ye-aluminium. | |||
18 | Ukuphawula | I-wafer yebanga likaMechanical ye-GaAs iyatholakala nangesicelo. |
Ifomula yomugqa | I-GaAs |
Isisindo samangqamuzana | 144.64 |
Isakhiwo sekristalu | Inhlanganisela yeZinc |
Ukubukeka | I-crystalline empunga eqinile |
I-Melting Point | 1400°C, 2550°F |
Iphuzu elibilayo | N/A |
Ukuminyana ku-300K | 5.32 g/cm3 |
Igebe Lamandla | 1.424 eV |
Ukumelana kwangaphakathi | 3.3E8 Ω-cm |
Inombolo ye-CAS | 1303-00-0 |
Inombolo ye-EC | 215-114-8 |
I-Gallium Arsenide Gase-Western Minmetals (SC) Corporation ingahlinzekwa njengesigaxa se-polycrystalline noma i-crystal wafer eyodwa kuma-wafer as-cut, aqoshiwe, aphucuziwe, noma ama-epi-ready ready kasayizi ongu-2” 3” 4” no-6” (50mm, 75mm, 100mm , 150mm) ububanzi, nohlobo lwe-p, uhlobo lwe-n noma i-semi-insulating conductivity, kanye nokuma kwe-<111> noma <100>.Ukucaciswa okwenziwe ngezifiso kuyisixazululo esiphelele kumakhasimende ethu emhlabeni jikelele.
Amathiphu Okuthenga
I-Gallium Arsenide Wafer